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100  mm diameter silicon wafer has 1 μm lines fabricated on it. The photomask is made of soda lime glass with a coefficient of thermal expansion (CTE) of 10 ppm(10 ×10^-6 / ^∘ C). How accurately must the temperature in the patterning process be controlled in order to keep distortions from thermal expansion over 100  mm wafer below 0.3 μm ? Silicon CTE is 2.5 ×10^-6 / ^∘ C. | Numerade
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