Next-generation lithography or NGL is a term used in integrated circuit manufacturing to describe the lithography technologies in development which are intended to replace current techniques. …

Aug 31, 2007 · The evolution of the foreign and native search for solving the problem of a nuclear gamma-ray laser (NGL), which has been attracting attention for almost half a century despite …

The evolution of the foreign and native search for solving the problem of a nuclear gamma-ray laser (NGL), which has been attracting attention for almost half a century despite the absence …

Jan 14, 2000 · Description: A focused ion beam (FIB) tool that uses 75keV He ions to expose the resist. The FIB system consists of an ion source, a beam defining aperture, and electrostatic …

Jan 1, 1999 · In the following sections, I will describe the elements of each of the prospective NGL technologies. X-ray - This is conceptually the sim- plest of the exposure technologies.

Apr 2, 2010 · Four basic schemes for a nuclear gamma-ray laser (NGL) are analyzed using the “NGL-hyper-bola” as a generalized comparative criterion: solid state Mössbauer scheme; …

This excerpt gives a succinct explanation of Next-Generation Lithography (NGL). Online access to SPIE eBooks is limited to subscribing institutions. Erratum Email Alerts notify you when an …

Following the basic concept of NGL and applying it to proximity x-ray lithography, we are developing a technique to form features on a wafer substantially smaller than those on the mask.

Dec 30, 1999 · Mask fabrication is one of the difficult challenges with all Next Generation Lithography (NGL) technologies. X-ray, e-beam projection, and ion-beam projection …

May 1, 2010 · Four basic schemes for a nuclear gamma-ray laser (NGL) are analyzed using the “NGL-hyper-bola” as a generalized comparative criterion: solid state Mössbauer scheme; …