May 16, 2022 · In this research boron thin films are realized by a number of physical and chemical deposition methods, including magnetron sputtering, electron-beam evaporation, plasma enhanced chemical vapor...

May 16, 2022 · In this research boron thin films are realized by a number of physical and chemical deposition methods, including magnetron sputtering, electron-beam evaporation, plasma enhanced chemical vapor deposition (CVD), thermal/non-plasma CVD, remote plasma CVD and atmospheric pressure CVD.

Nov 15, 2017 · Micron-thick boron films have been deposited by Pulsed Laser Deposition in vacuum on several substrates at room temperature. The use of high energy pulses (> 700 mJ) results in the deposition of smooth coatings with low oxygen uptake even at …

Mar 2, 1999 · A boron film works as a hydrogen-isotope free wall at 300–400°C. This effect can be kept by heat flux from the plasma or from the blanket in long pulse machines. It gives a protecting layer against energetic charge exchange neutrals from the plasmas.

Feb 20, 2024 · In this paper, we examined the numerous methods used to synthesize boron nitride-based thin film coatings in various dimensions, as well as their attributes and potential applications.

Dec 1, 2016 · In this paper, the growth of boron (10 B) oxide films on (1 0 0) silicon substrate were achieved by radio frequency (r.f.) magnetron sputtering under the different oxygen partial pressure with a target of boron and boron oxide.

Nov 16, 2018 · Here, we report a method of synthesizing wafer-scale single-crystalline hBN (SC-hBN) monolayer films by chemical vapor deposition. The limited solubility of boron (B) and nitrogen (N) atoms in liquid gold promotes high diffusion of adatoms on the surface of liquid at high temperature to provoke the circular hBN grains.

Apr 18, 2017 · RF magnetrons can be used to produce films of boron (and other materials) of high purity, with applications, e.g., in the field of microelectronics.

Jan 12, 2019 · This study investigated the production of boron films by femtosecond pulsed laser deposition (PLD) to be used as converters on bulk semiconductor neutron detectors. The ablation threshold of metallic boron was determined and the film growth was studied as a function of deposition time (5–90 min) and laser pulse energy (35–530 μJ).

May 13, 2024 · Here, the authors demonstrate a wafer-scale, low-temperature process using atomic layer deposition, for the synthesis of uniform, conformal amorphous boron nitride (aBN) thin films.